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Microfabrication Laboratory

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Contact Information


Research Specification

Microfabrication laboratory in cleanrooms environment for academic and industrial users.

Research Personnel

  • Professors/Researchers: 5
  • Research Assistants and Technicians: 5

Specialized Equipments

  • Dual focus ion beam (FEI strata DB-235)
Patterning, local deposition and etching, device characterization
  • Deep Reactive Ion Etching (Plasmalab 100, ICP 180)
Cryo and Bosch deep silicon etching
  • Mask aligners (Karl Suss MA-4 et MBJ-3)
IR alignment back side alignment
1 µm resolution and alignment accuracy
  • E-beam and magnetron sputtering deposition chamber for metallic material
6 crucibles (Cr, Au, Ti, Ag, Ni, Pt, material on request)
4 sputtering targets (NiCr, Pd, Co, Cu, material on request)
  • Magnetron sputtering system for ceramics and complex materials
  • Vapor HF etcher (Idonus)
  • Critical point dryer (Tousimis 815B C series)
  • Rapid Thermal Annealing (AG associate 410)
N2, N2H2, Ar and O2 gases
Thermocouple and pyrometer temperature control
  • Parylene coater (Cookson PDS 2010 II)
  • Ozone cleaner (UVOCS)
  • Reactive ion etching (Technics)
  • Wet etching capabilities
  • TMAH anisotropic etching
  • Nikon microscope with Normasky prism
  • Dektak (Veeco dektak 3st)
  • Scanning Electron Microscopes (Philips XL-20)
  • Thermal oxidation furnace (Thermco)

External Sources of Funding

 NSERC; FQRNT and Fee Users.


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