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Laboratory for the Epitaxy and Characterization of Compound Semiconductors

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Contact Information


Research Specification

The MOCVD (Metal-Organic Chemical Vapor Deposition) Laboratory concentrates on the growth and characterization of thin III-V compound semiconductor layers and heterostructures based on InP for electronic and optoelectronic device applications.

For complete information, visit the web site.

Research Personnel

  • Professors/Researchers: 1
  • Graduate Students: 4
  • Postdoctoral Fellows: 1

Specialized Equipments

Low pressure MOCVD reactor; Philips high-resolution X-ray diffractometer (w/triple axes); Hall effect measurement set-up (77K, 300K); cryostat with superconducting magnet (4-300K; 0-14T).

External Sources of Funding



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